Open AccessXPS Study on Chemical Bonding States of high-κ/high-μ Gate Stacks for Advanced CMOS
Author(s) -
Hiroshi Nohira,
Arata Komatsu,
Koji Yamashita,
Kuniyuki Kakushima,
Hiroshi Iwai,
Yusuke Hoshi,
Kentarou Sawano,
Y. Shiraki
Publication year - 2011
Publication title -
ecs meeting abstracts
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-02/32/2122
Subject(s) - x ray photoelectron spectroscopy , cmos , materials science , chemical state , optoelectronics , nanotechnology , engineering physics , chemical engineering , engineering
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