Open AccessAnodic Etching of InP Substrate through Photoresist Mask Formed by Sphere Photolithography
Author(s) -
Jun Iwata,
Hidetaka Asoh,
Sachiko Ono
Publication year - 2011
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-02/2/38
Subject(s) - photoresist , photolithography , etching (microfabrication) , substrate (aquarium) , materials science , optoelectronics , nanotechnology , optics , geology , physics , oceanography , layer (electronics)
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom