Open AccessUltra Low Dielectric Constant Materials for 22 nm Technology Node and beyond
Author(s) -
Mikhaı̈l R. Baklanov
Publication year - 2011
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-01/22/1407
Subject(s) - dielectric , materials science , node (physics) , engineering physics , constant (computer programming) , high κ dielectric , optoelectronics , physics , computer science , acoustics , programming language
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom