Open AccessHigh Dose Implant Resist Stripping (HDIS) Using Catalyzed Hydrogen Peroxide (CHP) Systems
Author(s) -
Rajkumar Govindarajan,
Manish Keswani,
Srini Raghavan
Publication year - 2011
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-01/20/1308
Subject(s) - resist , hydrogen peroxide , stripping (fiber) , catalysis , implant , materials science , nuclear chemistry , chemistry , nanotechnology , composite material , surgery , organic chemistry , medicine , layer (electronics)
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