Open AccessFactors Influencing PL, EL, and Charge Storage Characteristics of Si Nanocrystal Embedded SiOxNy Thin Films
Author(s) -
P. C. Joshi,
Luke Tang,
Jiandong Huang,
Apostolos T. Voutsas,
John Hartzell
Publication year - 2011
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-01/19/1235
Subject(s) - nanocrystal , materials science , charge (physics) , thin film , nanotechnology , optoelectronics , engineering physics , physics , quantum mechanics
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