Open AccessAtomic Layer Deposition of Al-Doped ZrO2 Thin Films for Advanced Gate Stack on III-V Substrates
Author(s) -
L. Lamagna,
Alessandro Molle,
C. Wiemer,
Sabina Spiga,
M. Fanciulli
Publication year - 2011
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-01/18/1230
Subject(s) - atomic layer deposition , stack (abstract data type) , layer (electronics) , deposition (geology) , materials science , doping , thin film , optoelectronics , nanotechnology , computer science , geology , operating system , paleontology , sediment
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