Open AccessHeterogeneous Integration and Fabrication of III-V MOS Devices in a 200mm Processing Environment
Author(s) -
Niamh Waldron,
Ngoc Duy Nguyen,
Dennis Lin,
Guy Brammertz,
Benjamin Vincent,
Andrea Firrincieli,
Gillis Winderick,
Sonja Sioncke,
Brice De Jaeger,
Gang Wang,
Jérôme Mitard,
Wei Wang,
Marc Heyns,
Matty Caymax,
Marc Meuris,
P. Absil,
Thomas Hoffmann
Publication year - 2011
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2011-01/18/1214
Subject(s) - fabrication , materials science , computer science , embedded system , medicine , pathology , alternative medicine
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