Open AccessDegradation in HfSiON Film Induced by Electrical Stress Application
Author(s) -
Ryu Hasunuma,
Chihiro Tamura,
Tsuyoshi Nomura,
Yuuki Kikuchi,
Kenji Ohmori,
Motoyuki Sato,
Akira Uedono,
Toyohiro Chikyow,
Kenji Shiraishi,
Keisaku Yamada,
Kikuo Yamabe
Publication year - 2010
Publication title -
ecs meeting abstracts
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2010-01/18/995
Subject(s) - degradation (telecommunications) , materials science , stress (linguistics) , engineering physics , forensic engineering , electrical engineering , engineering , linguistics , philosophy
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