Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Isopropoxide and Ozone
Author(s) -
Vikrant Rai,
Sumit Agarwal
Publication year - 2008
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2008-01/21/775
Subject(s) - ozone , titanium , atomic layer deposition , titanium dioxide , layer (electronics) , deposition (geology) , mechanism (biology) , chemistry , materials science , chemical engineering , inorganic chemistry , nanotechnology , metallurgy , physics , geology , organic chemistry , paleontology , quantum mechanics , sediment , engineering
not Available.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom