Open AccessPhotoemission Study of Metal/HfSiON Gate Stack
Author(s) -
Seiichi Miyazaki,
Hiromichi Yoshinaga,
Akio Ohta,
Y. Akasaka,
Kenji Shiraishi,
Keisaku Yamada,
Seiji Inumiya,
Masaru Kadoshima,
Yasuo Nara
Publication year - 2008
Publication title -
ecs meeting abstracts
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2008-01/18/703
Subject(s) - stack (abstract data type) , materials science , metal , optoelectronics , metal gate , engineering physics , nanotechnology , electrical engineering , metallurgy , computer science , physics , engineering , gate oxide , transistor , programming language , voltage
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