Open AccessStructural and Electrical Properties of High Pressure Hydrogen Post-Annealed Pt-Er Alloy Metal Gate on HfO2 Film
Author(s) -
ChelJong Choi,
Moongyu Jang,
Yarkyeon Kim,
Myung-Sim Jeon,
Seongjae Lee,
Hyundoek Yang,
Ranju Jung,
Man Chang,
Hyunsang Hwang
Publication year - 2007
Publication title -
ecs meeting abstracts
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2007-01/12/582
Subject(s) - materials science , alloy , high pressure , metal , annealing (glass) , hydrogen , metallurgy , optoelectronics , engineering physics , chemistry , engineering , organic chemistry
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