Open AccessOptimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
Author(s) -
Chris Hodson,
Nick Singh,
S. B. S. Heil,
Hans van Hemmen,
Erwin Kessels
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2006-02/21/1076
Subject(s) - nitride , deposition (geology) , atomic layer deposition , plasma , layer (electronics) , materials science , chemical engineering , nanotechnology , physics , nuclear physics , engineering , geology , paleontology , sediment
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