Open AccessPlasma Etching Challenges of New Materials Involved in Gate Stack Patterning for sub 45 nm Technological Nodes
Author(s) -
O. Joubert,
A. Legouil,
R. Ramos,
M. Hélot,
G. Cunge,
L. Vallier,
T. Chevolleau
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2006-01/8/367
Subject(s) - stack (abstract data type) , etching (microfabrication) , plasma etching , materials science , nanotechnology , plasma , optoelectronics , reactive ion etching , engineering physics , computer science , layer (electronics) , engineering , physics , operating system , quantum mechanics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom