Open AccessComparison of ZnO Dry Etching in High Density Inductively Coupled CH4/H2 and C2H6/H2-based Chemistries
Author(s) -
Wantae Lim,
S. J. Pearton,
Lars F. Voss,
Rohit Khanna,
Jonathan O. Wright,
F. Ren,
D. P. Norton
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2006-01/11/503
Subject(s) - inductively coupled plasma , dry etching , etching (microfabrication) , inductively coupled plasma atomic emission spectroscopy , chemistry , analytical chemistry (journal) , materials science , environmental chemistry , nanotechnology , plasma , physics , layer (electronics) , quantum mechanics
not Available.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom