Open AccessIon-Enhanced Plasma Etching of Metal Oxides in Chlorine Based Plasmas
Author(s) -
Ryan M. Martin,
Monica Sawkar,
HansOlof Blom,
Jane P. Chang
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-02/13/562
Subject(s) - chlorine , plasma , etching (microfabrication) , ion , materials science , plasma etching , metal , reactive ion etching , chemistry , metallurgy , nanotechnology , physics , nuclear physics , organic chemistry , layer (electronics)
not Available.
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