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Ultra-Thin HfON Films Formed with He/FG Plasma Jet Assisted PVD Process
Author(s) -
Yanxiang Liu,
Sharon Wang,
T.P. Ma
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-02/13/549
Subject(s) - materials science , jet (fluid) , process (computing) , plasma , composite material , computer science , mechanics , physics , nuclear physics , operating system

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