Open AccessPost Metallization Anneal Effects in HfO2 Based Capacitors with Various Gate Electrodes
Author(s) -
Yi Lu,
O. Buiu,
Ivona Z. Mitrović,
S. Hall,
Paul R. Chalker,
Richard J. Potter,
A. N. Nazarov,
В. С. Лысенко
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-02/13/537
Subject(s) - materials science , capacitor , electrode , optoelectronics , electronic engineering , electrical engineering , voltage , chemistry , engineering
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