Open AccessDoped HfO2 for Higher-k Dielectrics
Author(s) -
Akira Toriumi,
Y. Yamamoto,
Yi Zhao,
Kazuyuki Tomida,
Koji Kita
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-02/13/508
Subject(s) - doping , dielectric , materials science , high κ dielectric , engineering physics , optoelectronics , physics
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