Open AccessChemical Mechanical Polishing (CMP) of Doped and Undoped Ceramic and Polymeric Dielectric Materials for Microelectronic Applications
Author(s) -
Parshuram B. Zantye,
Ashok Kumar,
Jiro Yota
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-01/9/438
Subject(s) - microelectronics , chemical mechanical planarization , polishing , materials science , ceramic , dielectric , doping , composite material , engineering physics , nanotechnology , optoelectronics , engineering
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