Open AccessNb and NbN Metal Gates for Gate Stacks with High-k Dielectrics
Author(s) -
Matthias Schmidt,
A. Ludsteck,
F. Wiest,
Jörg Schulze,
I. Eisele
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-01/14/642
Subject(s) - high κ dielectric , materials science , dielectric , metal gate , gate dielectric , optoelectronics , metal , engineering physics , electrical engineering , gate oxide , metallurgy , physics , engineering , transistor , voltage
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