Open AccessBCB Deep Via Etching Process on ICP Etching System
Author(s) -
Jennifer Wang,
C. Monier,
P.C. Chang,
Xianglin Zeng,
Danny H.W. Li,
Mike Barsky,
A. Gutierrez-Aitken
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-01/13/594
Subject(s) - etching (microfabrication) , process (computing) , materials science , dry etching , optoelectronics , process engineering , nanotechnology , computer science , engineering , layer (electronics) , operating system
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom