Open AccessElectrical and Interface Analysis of ZrO2/ZrSiOx Stack Layers on p-Si (100) with Nitrogen Incorporation Treatment
Author(s) -
Chi Hoon Lee,
Byoung Sun Ju,
Hyeong Joon Kim,
G. Lucovsky
Publication year - 2006
Publication title -
meeting abstracts/meeting abstracts (electrochemical society. cd-rom)
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2005-01/1/52
Subject(s) - stack (abstract data type) , nitrogen , interface (matter) , materials science , computer science , chemistry , composite material , operating system , organic chemistry , capillary action , capillary number
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