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Effect of Electron Injection on Minority Carrier Transport in 10 MeV Proton Irradiated β-Ga2O3 Schottky Rectifiers
Author(s) -
Sushrut Modak,
Leonid Chernyak,
Sergey Khodorov,
Igor Lubomirsky,
A. Ruzin,
Minghan Xian,
F. Ren,
S. J. Pearton
Publication year - 2020
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ab902b
Subject(s) - materials science , fluence , proton , irradiation , schottky diode , electron , atomic physics , diffusion , schottky barrier , doping , electron beam processing , schottky effect , analytical chemistry (journal) , activation energy , optoelectronics , nuclear physics , physics , chemistry , diode , chromatography , thermodynamics
We report the effect of extended duration electron beam exposure on the minority carrier transport properties of 10 MeV proton irradiated (fluence ∼10 14 cm −2 ) Si-doped β -Ga 2 O 3 Schottky rectifiers. The diffusion length ( L ) of minority carriers is found to decrease with temperature from 330 nm at 21 °C to 289 nm at 120 °C, with an activation energy of ∼26 meV. This energy corresponds to the presence of shallow Si trap-levels. Extended duration electron beam exposure enhances L from 330 nm to 726 nm at room temperature. The rate of increase for L is lower with increased temperature, with an activation energy of 43 meV. Finally, a brief comparison of the effect of electron injection on proton irradiated, alpha-particle irradiated and a reference Si-doped β -Ga 2 O 3 Schottky rectifiers is presented.

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