Open AccessOxide Formation and Dissolution on Silicon in KOH Electrolyte: An In-Situ Infrared Study
Author(s) -
Harold Philipsen,
François Ozanam,
P. Allongue,
J. J. Kelly,
J.N. Chazalviel
Publication year - 2016
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0911605jes
Subject(s) - dissolution , electrolyte , oxide , chemistry , infrared spectroscopy , silicon , infrared , analytical chemistry (journal) , layer (electronics) , open circuit voltage , inorganic chemistry , electrode , organic chemistry , optics , physics , quantum mechanics , voltage
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