Open AccessIn Situ Measurement for Diffusion-Adsorption Process of Cl− and SPS in Through-Silicon Via Using SERS Effect Produced by Cu Nanodot Arrays
Author(s) -
Masahiro Kunimoto,
Futa Yamaguchi,
Masahiro Yanagisawa,
Takayuki Homma
Publication year - 2019
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0801906jes
Subject(s) - nanodot , in situ , silicon , diffusion , materials science , adsorption , analytical chemistry (journal) , nanotechnology , chemical engineering , chemistry , optoelectronics , physics , thermodynamics , organic chemistry , engineering , chromatography
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