Analysis of the Cathode Electrical Contact in SOFC Stacks
Author(s) -
David Kennouche,
Qingping Fang,
L. Blum,
Detlef Stolten
Publication year - 2018
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0761809jes
Subject(s) - cathode , ohmic contact , stack (abstract data type) , dielectric spectroscopy , contact resistance , materials science , electrical impedance , degradation (telecommunications) , relaxation (psychology) , solid oxide fuel cell , electrical contacts , oxide , layer (electronics) , electrochemistry , analytical chemistry (journal) , composite material , electrode , forensic engineering , chemistry , electronic engineering , electrical engineering , metallurgy , anode , computer science , psychology , social psychology , chromatography , programming language , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom