Open AccessThe Susceptibility of Copper to Pitting Corrosion in Borate-Buffered Aqueous Solutions Containing Chloride and Sulfide
Author(s) -
Mengnan Guo,
Jian Chen,
Taylor Martino,
Mark C. Biesinger,
James J. Noël,
David W. Shoesmith
Publication year - 2019
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0611915jes
Subject(s) - sulfide , inorganic chemistry , chloride , oxide , dissolution , chemistry , aqueous solution , x ray photoelectron spectroscopy , copper , raman spectroscopy , pitting corrosion , electrochemistry , copper sulfide , corrosion , chemical engineering , electrode , organic chemistry , physics , optics , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom