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Electrodeposition of Crystalline HgTe from a Non-Aqueous Plating Bath
Author(s) -
Gabriela P. Kissling,
M. H. Abdel Aziz,
Andrew Lodge,
Wenjian Zhang,
Mehrdad Alibouri,
Ruomeng Huang,
Andrew L. Hector,
Gillian Reid,
C.H. de Groot,
Richard Beanland,
Philip N. Bartlett,
David C. Smith
Publication year - 2018
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0421816jes
Subject(s) - stoichiometry , plating (geology) , crystallinity , aqueous solution , dichloromethane , electrochemistry , deposition (geology) , materials science , characterization (materials science) , chemical engineering , chemistry , inorganic chemistry , nanotechnology , composite material , electrode , organic chemistry , solvent , paleontology , geophysics , sediment , engineering , biology , geology
This paper presents a method for the electrodeposition of stoichiometric, crystalline HgTe, which provides advantages over conventional HgTe preparation techniques, such as physical and chemical vapor deposition, in a number of ways; e.g. fast deposition rates (2 mm/hr) and the ability to reliably produce stoichiometric or near-stoichiometric material. The HgTe is prepared in a dichloromethane based plating bath using [NnBu4]2[TeCl6] and [NnBu4]2[HgCl4] as the precursors for Te and Hg, respectively. The paper details the electrochemical behavior of the plating bath and its components, together with a detailed characterization of the morphology, crystallinity and composition of the prepared HgTe.

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