Vertical and Smooth Single-Step Reactive Ion Etching Process for InP Membrane Waveguides | Zendy

Yuqing Jiao | Zendy; T. de Vries | Zendy; Ralph-Stephan Unger | Zendy; Longfei Shen | Zendy; H.P.M.M. Ambrosius | Zendy; Calin Radu | Zendy; Michael Arens | Zendy; M.K. Smit | Zendy; Jos van der Tol | Zendy

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Vertical and Smooth Single-Step Reactive Ion Etching Process for InP Membrane Waveguides

Author(s) -

Yuqing Jiao,

T. de Vries,

Ralph-Stephan Unger,

Longfei Shen,

H.P.M.M. Ambrosius,

Calin Radu,

Michael Arens,

M.K. Smit,

Jos van der Tol

Publication year - 2015

Publication title -

journal of the electrochemical society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.258

H-Index - 271

eISSN - 1945-7111

pISSN - 0013-4651

DOI - 10.1149/2.0371508jes

Subject(s) - reactive ion etching , etching (microfabrication) , materials science , waveguide , surface roughness , membrane , process (computing) , surface finish , optoelectronics , optics , ion , nanotechnology , layer (electronics) , composite material , chemistry , computer science , physics , organic chemistry , operating system , biochemistry

In this paper we present a novel single-step RIE process for InP membrane optical waveguide etching. The optimization of the process is focused on the sidewall verticality and surface roughness of the etched profile. Significant improvement on the etched profile is achieved for the first time in a single-step RIE process. Loss measurement on fabricated membrane waveguides etched with the proposed RIE process results in a record low waveguide propagation loss (2.5 dB/cm).

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