Open AccessAtomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates
Author(s) -
Kaupo Kukli,
Marianna Kemell,
Helena Castán,
S. Dueñas,
Helina Seemen,
Mihkel Rähn,
Joosep Link,
Raivo Stern,
Mikko Ritala,
Markku Leskelä
Publication year - 2018
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2.0261809jss
Subject(s) - materials science , atomic layer deposition , monoclinic crystal system , nanocrystalline material , metastability , layer (electronics) , metal , oxide , deposition (geology) , analytical chemistry (journal) , nanotechnology , crystallography , metallurgy , crystal structure , paleontology , chemistry , physics , quantum mechanics , chromatography , sediment , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom