Open AccessAtomic Layer Deposition of TiO2on Graphene for Supercapacitors
Author(s) -
Xiang Sun,
Ming Xie,
Gongkai Wang,
Hongtao Sun,
Andrew S. Cavanagh,
Jonathan J. Travis,
Steven M. George,
Jie Lian
Publication year - 2012
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.025204jes
Subject(s) - graphene , atomic layer deposition , supercapacitor , materials science , nanocomposite , oxide , coating , layer (electronics) , deposition (geology) , electrochemistry , nyquist plot , graphene foam , composite material , chemical engineering , graphene oxide paper , nanotechnology , electrode , chemistry , dielectric spectroscopy , metallurgy , paleontology , engineering , sediment , biology
A nano-scaled coating of titanium oxide (TiO2) on graphene (G) has been achieved via a novel atomic layer deposition (ALD) method. As a potential supercapacitor material, the TiO2-G composites exhibited a capacity of 75 F/g and 84 F/g at a scan rate of 10 mV/s for composites grown using 50 and 100 ALD cycles, respectively. The nearly identical Nyquist plots of the TiO2-G composites compared with those of pure graphene demonstrated that the composites possess excellent conductivity for charge transfer and open structures for ion diffusion. In addition, even with 3-4 times additional mass loading (maximum 3.22 mg/cm2), the composites exhibit no obvious degradation with respect to the electrochemical performance. This ALD approach presents a promising route to synthesize advanced graphene-based nanocomposites for supercapacitor applications. © 2012 The Electrochemical Society. [DOI: 10.1149/2.025204jes] All rights reserved
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