Open AccessSelf-Limiting Growth and Thickness- and Temperature- Dependence of Optical Constants of ALD AlN Thin Films
Author(s) -
Hao Van Bui,
Minh D. Nguyen,
F. B. Wiggers,
Antonius A. I. Aarnink,
M. P. de Jong,
Alexey Y. Kovalgin
Publication year - 2014
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2.020404jss
Subject(s) - materials science , atomic layer deposition , nucleation , thin film , ellipsometry , refractive index , deposition (geology) , analytical chemistry (journal) , limiting , thermal decomposition , carbon fibers , nanotechnology , composite number , composite material , optoelectronics , chemistry , organic chemistry , mechanical engineering , engineering , paleontology , sediment , biology
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