Open AccessThe Impact of Different Si Surface Terminations in the (001) n-Si/NiOx Heterojunction on the Oxygen Evolution Reaction (OER) by XPS and Electrochemical Methods
Author(s) -
Sven Tengeler,
Mathias Fingerle,
Wolfram Calvet,
Céline Steinert,
Bernhard Kaiser,
Thomas Mayer,
Wolfram Jaegermann
Publication year - 2018
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0151804jes
Subject(s) - x ray photoelectron spectroscopy , heterojunction , band bending , materials science , oxide , silicon , monolayer , cyclic voltammetry , sputtering , oxygen evolution , analytical chemistry (journal) , electrochemistry , thin film , chemical engineering , chemistry , electrode , nanotechnology , optoelectronics , metallurgy , engineering , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom