Atomic Layer Deposition of Nanolaminate Structures of Alternating PbTe and PbSe Thermoelectric Films | Zendy

K. Zhang | Zendy; Arun Deepak Ramalingom Pillai | Zendy; K. Bollenbach | Zendy; David Nminibapiel | Zendy; Wei Cao | Zendy; Helmut Baumgart | Zendy; Torsten Scherer | Zendy; Venkata Sai Kiran Chakravadhanula | Zendy; Christian Kübel | Zendy; Vladimir Kochergin | Zendy

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Atomic Layer Deposition of Nanolaminate Structures of Alternating PbTe and PbSe Thermoelectric Films

Author(s) -

K. Zhang,

Arun Deepak Ramalingom Pillai,

K. Bollenbach,

David Nminibapiel,

Wei Cao,

Helmut Baumgart,

Torsten Scherer,

Venkata Sai Kiran Chakravadhanula,

Christian Kübel,

Vladimir Kochergin

Publication year - 2014

Publication title -

ecs journal of solid state science and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.488

H-Index - 51

eISSN - 2162-8777

pISSN - 2162-8769

DOI - 10.1149/2.014406jss

Subject(s) - atomic layer deposition , materials science , lead telluride , lead selenide , thermoelectric effect , thin film , layer (electronics) , cadmium telluride photovoltaics , silicon , telluride , bilayer , nucleation , nanotechnology , deposition (geology) , superlattice , chemical engineering , optoelectronics , metallurgy , chemistry , organic chemistry , paleontology , biochemistry , physics , doping , membrane , sediment , biology , engineering , thermodynamics

and bis-(triethyl silyl) selane ((Et3Si)2Se) as ALD precursors for lead, tellurium and selenium. The experimental evidence revealed the ALD growth of lead telluride and lead selenide followed the Vollmer-Weber island growth mode. We found a strong dependence of the nucleation process on the temperature. In this paper, we present the optimized conditions for growing PbTe and PbSe thin film nanolaminates within the ALD process window range of 170 ◦ C to 210 ◦ C and discuss an early nano-scale PbTe/PbSe bilayer

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