Investigation of Electron Cyclotron Resonance Chemical Vapor Deposition Process for a-Si:H Deposition, Film Characterization and In Situ Plasma Diagnostics | Zendy

Lei Hu | Zendy; C. J. Wang | Zendy; Yu-Feng Lin | Zendy; T. C. Wei | Zendy; Chien-Chieh Lee | Zendy; Jenq-Yang Chang | Zendy; IChen Chen | Zendy; Yoshinobu Kawai | Zendy; T. T. Li | Zendy

Open Access

Investigation of Electron Cyclotron Resonance Chemical Vapor Deposition Process for a-Si:H Deposition, Film Characterization and In Situ Plasma Diagnostics

Author(s) -

Lei Hu,

C. J. Wang,

Yu-Feng Lin,

T. C. Wei,

Chien-Chieh Lee,

Jenq-Yang Chang,

IChen Chen,

Yoshinobu Kawai,

T. T. Li

Publication year - 2015

Publication title -

ecs journal of solid state science and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.488

H-Index - 51

eISSN - 2162-8777

pISSN - 2162-8769

DOI - 10.1149/2.0141507jss

Subject(s) - electron cyclotron resonance , materials science , analytical chemistry (journal) , langmuir probe , electronegativity , plasma , silane , chemical vapor deposition , thin film , plasma parameters , plasma enhanced chemical vapor deposition , germane , plasma diagnostics , silicon , chemistry , nanotechnology , optoelectronics , physics , organic chemistry , germanium , chromatography , quantum mechanics , composite material

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research