Open AccessAtomic Layer Deposition and Characterization of Amorphous ErxTi1-xOyDielectric Ultra-Thin Films
Author(s) -
Runshen Xu,
Christos G. Takoudis
Publication year - 2012
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2.013206jss
Subject(s) - materials science , atomic layer deposition , amorphous solid , dielectric , x ray photoelectron spectroscopy , thin film , analytical chemistry (journal) , thermal stability , nanotechnology , chemical engineering , optoelectronics , crystallography , chemistry , chromatography , engineering
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