Open AccessOn The Mechanism of the Anisotropic Dissolution of Silicon in Chlorine Containing Hydrofluoric Acid Solutions
Author(s) -
André Stapf,
Peter Nattrodt,
Edwin Kroke
Publication year - 2017
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/2.0061804jes
Subject(s) - hydrofluoric acid , silicon , dissolution , chemistry , chlorine , etching (microfabrication) , inorganic chemistry , oxidizing agent , aqueous solution , hydrochloric acid , wafer , scanning electron microscope , analytical chemistry (journal) , materials science , organic chemistry , nanotechnology , layer (electronics) , composite material
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