Editors' Choice—Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications
Author(s) -
Alain E. Kaloyeros,
Youlin Pan,
Jonathan Goff,
Barry Arkles
Publication year - 2019
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2.0051902jss
Subject(s) - cobalt , materials science , metalorganic vapour phase epitaxy , chemical vapor deposition , thin film , nanotechnology , deposition (geology) , atomic layer deposition , layer (electronics) , engineering physics , metallurgy , epitaxy , engineering , sediment , biology , paleontology
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