Electric and Magnetic Properties of Atomic Layer Deposited ZrO2-HfO2Thin Films | Zendy

Kristjan Kalam | Zendy; Helina Seemen | Zendy; Mats Mikkor | Zendy; Peeter Ritslaid | Zendy; Raivo Stern | Zendy; S. Dueñas | Zendy; Helena Castán | Zendy; Aile Tamm | Zendy; Kaupo Kukli | Zendy

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Electric and Magnetic Properties of Atomic Layer Deposited ZrO₂-HfO₂Thin Films

Author(s) -

Kristjan Kalam,

Helina Seemen,

Mats Mikkor,

Peeter Ritslaid,

Raivo Stern,

S. Dueñas,

Helena Castán,

Aile Tamm,

Kaupo Kukli

Publication year - 2018

Publication title -

ecs journal of solid state science and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.488

H-Index - 51

eISSN - 2162-8777

pISSN - 2162-8769

DOI - 10.1149/2.0041809jss

Subject(s) - hafnia , materials science , tetragonal crystal system , monoclinic crystal system , thin film , ferroelectricity , cubic zirconia , ferromagnetism , metastability , doping , atomic layer deposition , layer (electronics) , analytical chemistry (journal) , condensed matter physics , nanotechnology , crystallography , dielectric , composite material , crystal structure , optoelectronics , ceramic , physics , chemistry , quantum mechanics , chromatography

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