Open AccessAtomic Layer Deposition of High Quality HfO2Using In-Situ Formed Hydrophilic Oxide as an Interfacial Layer
Author(s) -
Lei Han,
Jie Pan,
Qinglin Zhang,
Shibin Li,
Zhi Chen
Publication year - 2014
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2.0041412jss
Subject(s) - materials science , layer (electronics) , oxide , atomic layer deposition , substrate (aquarium) , chemical engineering , deposition (geology) , in situ , hysteresis , nanotechnology , metallurgy , chemistry , organic chemistry , paleontology , sediment , engineering , biology , oceanography , physics , quantum mechanics , geology
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