Electrochemical Deposition of Ni into Mesoporous Silicon | Zendy

Alexey Dolgyi | Zendy; Hanna Bandarenka | Zendy; S. L. Prischepa | Zendy; K. I. Yanushkevich | Zendy; Paolo Nenzi | Zendy; M. Balucani | Zendy; Vitaly Bondarenko | Zendy

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Electrochemical Deposition of Ni into Mesoporous Silicon

Author(s) -

Alexey Dolgyi,

Hanna Bandarenka,

S. L. Prischepa,

K. I. Yanushkevich,

Paolo Nenzi,

M. Balucani,

Vitaly Bondarenko

Publication year - 2012

Publication title -

ecs transactions

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.235

H-Index - 52

eISSN - 1938-6737

pISSN - 1938-5862

DOI - 10.1149/1.3699385

Subject(s) - nickel , mesoporous material , materials science , silicon , electrochemistry , nanowire , porous silicon , deposition (geology) , porosity , crystallite , chemical engineering , nanotechnology , metallurgy , composite material , electrode , chemistry , catalysis , paleontology , biochemistry , sediment , engineering , biology

Nickel nanowires have been formed by the stationary electrochemical deposition of nickel into mesoporous silicon from the modified Watts bath. The polycrystalline nature of the Ni deposit has been established as well as expansion of its lattice parameter in comparison with bulk nickel. Control of the potential of porous silicon during electrochemical deposition allows to determine the moment of complete filling of pore space with Ni. The maximum achieved filling factor was 67% of the pores. The pore dimensions have been found to define the length and the diameter of the Ni nanowires that have equaled to 10 um and 100-120 nm, respectively. ©The Electrochemical Society

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