Open AccessLow Pressure Chemical Vapor Deposition of Aluminum-Doped Zinc Oxide for Transparent Conducting Electrodes
Author(s) -
WooHee Kim,
W. J. Maeng,
MinKyu Kim,
Hyungjun Kim
Publication year - 2011
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.3599055
Subject(s) - materials science , doping , chemical vapor deposition , electrode , analytical chemistry (journal) , zinc , band gap , work function , dielectric , electrical resistivity and conductivity , oxide , transmittance , leakage (economics) , optoelectronics , metal , chemistry , metallurgy , electrical engineering , chromatography , engineering , economics , macroeconomics
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