Open AccessSingle-Step RIE Fabrication Process of Low Loss InP Waveguide Using CH[sub 4]∕H[sub 2] Chemistry
Author(s) -
Mykhaylo Lysevych,
Hark Hoe Tan,
F. Karouta,
C. Jagadish
Publication year - 2011
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.3532767
Subject(s) - undercut , reactive ion etching , etching (microfabrication) , fabrication , materials science , waveguide , surface finish , surface roughness , dry etching , polymer , plasma etching , optoelectronics , ridge , optics , layer (electronics) , composite material , geology , medicine , alternative medicine , pathology , paleontology , physics
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