Open AccessRemoval of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent
Author(s) -
D. Tsvetanova,
Rita Vos,
Kris Vanstreels,
D. Radisic,
Roger Sonnemans,
Ivan L. Berry,
Carlo Waldfried,
David T. Mattson,
J. DeLuca,
Guy Vereecke,
Paul Mertens,
Tatja. ParacVogt,
M. M. Heyns
Publication year - 2010
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.3524275
Subject(s) - photoresist , resist , solubility , irradiation , solvent , wavelength , materials science , ion , optoelectronics , chemistry , selectivity , photochemistry , chemical engineering , nanotechnology , layer (electronics) , organic chemistry , catalysis , physics , nuclear physics , engineering
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