Low Temperature Tandem Aluminum Oxides Prepared by DAC-ANO Compensation in Nitric Acid
Author(s) -
Che-Yu Yang,
JennGwo Hwu
Publication year - 2009
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.3211800
Subject(s) - capacitor , tandem , materials science , anodizing , oxide , aluminium , capacitance , optoelectronics , metal , leakage (economics) , stress (linguistics) , voltage , chemistry , composite material , electrical engineering , metallurgy , electrode , linguistics , philosophy , economics , macroeconomics , engineering
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