Open AccessElectrical and Chemical Properties of the HfO[sub 2]/SiO[sub 2]/Si Stack: Impact of HfO[sub 2] Thickness and Thermal Budget
Author(s) -
E. Martínez,
C. Leroux,
Nicolas Benedetto,
C. Gaumer,
M. Charbonnier,
Christophe Licitra,
C. Guedj,
F. Fillot,
S. Lhostis
Publication year - 2009
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.3153126
Subject(s) - x ray photoelectron spectroscopy , dipole , materials science , ellipsometry , stack (abstract data type) , dielectric , analytical chemistry (journal) , thermal , photoemission spectroscopy , chemistry , optoelectronics , thin film , thermodynamics , nanotechnology , nuclear magnetic resonance , physics , organic chemistry , chromatography , computer science , programming language
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