Open AccessDouble Epitaxial Isolation Method for the Fabrication of Integrated Circuit Transistors
Author(s) -
Kiyoshi Demizu
Publication year - 1971
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2407798
Subject(s) - fabrication , transistor , epitaxy , materials science , optoelectronics , electronic circuit , process (computing) , integrated circuit , layer (electronics) , isolation (microbiology) , simple (philosophy) , computer science , electronic engineering , nanotechnology , electrical engineering , engineering , bioinformatics , voltage , medicine , alternative medicine , pathology , biology , operating system , philosophy , epistemology
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