Open AccessPorosity Effects on Properties of Mesoporous Silica Low-k Films Prepared Using Tetraethylorthosilicate with Different Templates
Author(s) -
Chih-Yuan Ting,
HwoShuenn Sheu,
Wen-Fa Wu,
BenZu Wan
Publication year - 2006
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2388852
Subject(s) - porosity , materials science , dielectric , chemical engineering , bromide , mesoporous material , silanol , mesoporous silica , composite material , calcination , template , analytical chemistry (journal) , nanotechnology , chemistry , chromatography , organic chemistry , optoelectronics , catalysis , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom