z-logo
open-access-imgOpen Access
Depth Profiling of Chemical and Electronic Structures and Defects of Ultrathin HfSiON on Si(100)
Author(s) -
Seiichi Miyazaki,
Akio Ohta,
Seiji Inumiya,
Yasuo Nara,
Keisaku Yamada
Publication year - 2006
Publication title -
ecs transactions
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.235
H-Index - 52
eISSN - 1938-6737
pISSN - 1938-5862
DOI - 10.1149/1.2355709
Subject(s) - x ray photoelectron spectroscopy , chemical state , annealing (glass) , nitrogen , oxide , oxygen , analytical chemistry (journal) , materials science , chemical bond , yield (engineering) , chemistry , chemical engineering , metallurgy , organic chemistry , chromatography , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom