Open AccessDeposition Process of Amorphous Boron Carbide from CH[sub 4]∕BCl[sub 3]∕H[sub 2] Precursor
Author(s) -
Jérôme Berjonneau,
G. Chollon,
F. Langlais
Publication year - 2006
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2353566
Subject(s) - chemical vapor deposition , boron carbide , amorphous solid , boron , deposition (geology) , carbide , materials science , analytical chemistry (journal) , fourier transform infrared spectroscopy , kinetic energy , chemical reaction , chemical engineering , activation energy , chemistry , metallurgy , nanotechnology , crystallography , organic chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology
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